An Improvement of the Cut-off Potential Ratio by Enhance the Flatness of the G1 Grid in Color Electron Gun Manufacturing

摘要

One of the most important grids in the color electron gun is the G1 grid for its high sensitive characteristics in the cut-off voltage. For obtaining a better control in the cut-off potential ratio, a novel method was developed by controlling its concave and convex distribution to enhance the flatness on the G1 coin after the stamping process. It could be reached that the flatness level is less than 4 μm for a single aperture. This have help the cathode insertion and the cut-off potential ratio also has improved.