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MOICANA - Monolithic cointegration of QD-based InP on SiN as a versatile platform for the demonstration of high performance and low-cost PIC transmitters

机译:MOICANA-SiN上基于QD的InP的单片协整,作为演示高性能和低成本PIC发射器的通用平台

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摘要

The integration of optical sources in Si photonic transceivers has relied so far on externally coupled Ⅲ-Ⅴ laser dies withinthe assembly. These hybrid approaches are however complex and expensive, as there are additional cost-increasing factorscoming from the redundant testing of the pre- and post-coupled laser photonic chips. Further optimization of PhotonicIntegrated Circuits (PICs) cost and performance can be obtained only with radical technology advancements, such as the“holy grail” of Silicon Photonics; the monolithic integration of III-V sources on Si substrates. MOICANA project fundedby EU Horizon 2020 framework targets to develop the technological background for the epitaxy of InP Quantum Dotsdirectly on Si by Selective Area Growth with the best-in-class, in terms of losses and temperature sensitivity, in a CMOSfab, i.e. the SiN waveguide technology. In addition, MOICANA will develop the necessary interface for the seamless lighttransition between the III-V active and the SiN passive part of the circuitry featuring advanced multiplexing functionalityand a combination of efficient and broadband fiber coupling. Through this unique platform, MOICANA aims todemonstrate low cost, inherent cooler-less and energy efficient transmitters, attributes stemming directly from the low lossSiN waveguide technology and the QD nature of the laser’s active region. MOICANA is targeting to exploit the advantagesof the monolithic integrated PICs for the demonstration of large volume single-channel and WDM transmitter modules fordata center interconnects, 5G mobile fronthaul and coherent communication applications.
机译:到目前为止,Si光子收发器中光源的集成依赖于组件内部的外部耦合Ⅲ-Ⅴ激光管芯。但是,这些混合方法既复杂又昂贵,因为前/后耦合激光光子芯片的冗余测试会带来额外的成本增加因素。光子集成电路的成本和性能的进一步优化只能通过根本性的技术进步来实现,例如硅光子技术的“圣杯”。 Si衬底上III-V源的单片集成。由EU Horizo​​n 2020框架资助的MOICANA项目旨在通过损耗和温度敏感性在同类产品中以同类最佳的方法开发InP量子点直接在Si上进行外延生长的技术背景。在CMOS \ r \ nfab中,即SiN波导技术。此外,MOICANA将开发必要的接口,以实现电路的III-V有源和SiN无源部分之间的无缝光过渡,该过渡具有先进的复用功能,并结合了高效和宽带光纤耦合。通过这个独特的平台,MOICANA旨在证明低成本,固有的无制冷器和高能效发射器,这些特性直接源于低损耗\ nSiN波导技术和激光器有源区域的QD性质。 MOICANA的目标是利用单片集成PIC的优势来演示用于数据中心互连,5G移动前传和相干通信应用的大容量单通道和WDM发射机模块。

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  • 来源
    《Optical Interconnects XIX 》|2019年|1092410.1-1092410.11|共11页
  • 会议地点 0277-786X;1996-756X
  • 作者单位

    School of Physics, Aristotle University of Thessaloniki, Greece,Center for Interdisciplinary Research and Innovation, Aristotle University of Thessaloniki, Greece;

    School of Physics, Aristotle University of Thessaloniki, Greece,Center for Interdisciplinary Research and Innovation, Aristotle University of Thessaloniki, Greece;

    School of Physics, Aristotle University of Thessaloniki, Greece,Center for Interdisciplinary Research and Innovation, Aristotle University of Thessaloniki, Greece;

    Center for Interdisciplinary Research and Innovation, Aristotle University of Thessaloniki, Greece,Depatment of Informatics, Aristotle University of Thessaloniki, Greece;

    Ⅲ-Ⅴ Lab, a joint laboratory between Nokia, Thalès and CEA-LETI, 1 av. A. Fresnel 91767Palaiseau France;

    Ⅲ-Ⅴ Lab, a joint laboratory between Nokia, Thalès and CEA-LETI, 1 av. A. Fresnel 91767Palaiseau France;

    Ligentec SA, EPFL Innovation Park, Bâtiment C, CH-1015 Lausanne, Switzerland;

    Ligentec SA, EPFL Innovation Park, Bâtiment C, CH-1015 Lausanne, Switzerland;

    Technische Physik, Institute of Nanostructure Technologies and Analytics, CINSaT, University ofKassel, Germany;

    Technische Physik, Institute of Nanostructure Technologies and Analytics, CINSaT, University ofKassel, Germany;

    Department of Electrical Engineering, Technion – Israel Institute of Technology, Haifa, Israel;

    Department of Electrical Engineering, Technion – Israel Institute of Technology, Haifa, Israel;

    ADVA optical networking SE, Märzenquelle 1-3, 98617, Meiningen, Germany;

    ADVA optical networking SE, Märzenquelle 1-3, 98617, Meiningen, Germany,LHFT, Cauerstr. 9, 91058, Erlangen, Germany;

    Mellanox Technologies Ltd, Hakidma 26, 2069200 Yokneam, Israel;

    Mellanox Technologies Ltd, Hakidma 26, 2069200 Yokneam, Israel;

    VLC Photonics S.L., c/Camino de Vera s – 46022, Valencia, Spain;

    VLC Photonics S.L., c/Camino de Vera s – 46022, Valencia, Spain;

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