Growth and Characterization of Nanolayered TiN/CrN Multilayer Coatings

摘要

Nanolayered TiN/CrN multilayers were deposited on silicon substrates using a reactive DC magnetron sputtering process. The structural and mechanical properties of the coatings were studied using X-ray diffraction (XRD) and nanoindentation respectively. Effects of nitrogen flow rate (ηN_2), substrate bias (V_B), substrate temperature (T_S) and modulation wavelength (Λ) on the structure and the hardness of the coatings were studied. A nitrogen flow rate of 2.0 sccm, a substrate bias of -150 V and a substrate temperature of 400℃ resulted in TiN/ CrN coatings with {111} texture. Further, under these deposition conditions the coatings displayed superlattice structure for 40 A < L < 130 A, and at L = 80 A the coatings exhibited a maximum hardness of 3800 kg/mm~2.