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The effect of front-side silver metallization on underlying n+-p junction in multicrystalline silicon solar cells

机译:正面银金属化对多晶硅太阳能电池中下层n + -p结的影响

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We report on the effect of front-side Ag metallization on the underlying n+-p junction of multicrystalline Si solar cells. The junction quality beneath the contacts was investigated by characterizing the uniformities of the electrostatic potential and doping concentration across the junction, using scanning Kelvin probe force microscopy and scanning capacitance microscopy. We investigated cells with a commercial Ag paste (DuPont PV159) and fired at furnace setting temperatures of 800°, 840°, and 930°C, which results in actual cell temperatures ∲100°C lower than the setting temperature and the three cells being under-, optimal-, and over-fired. We found that the uniformity of the junction beneath the Ag contact was significantly degraded by the over-firing, whereas the junction retained good uniformity with the optimal- and under-fire temperatures. Further, Ag crystallites with widely distributed sizes from <100 nm to several Ωm were found at the Ag/Si interface of the over-fired cell. Large crystallites were imaged as protrusions into Si deeper than the junction depth. However, the junction was not broken down; instead, it was reformed on the entire front of the crystallite/Si interface. We propose a mechanism of the junction-quality degradation, based on emitter Si melting at the temperature around the Ag-Si eutectic point during firing, and subsequent recrystallization with incorporation of impurities in the Ag paste and with formation of crystallographic defects during quenching.
机译:我们报告了正面Ag金属化对多晶硅Si太阳能电池下面的n + -p结的影响。使用扫描开尔文探针力显微镜和扫描电容显微镜,通过表征整个连接处的静电势和掺杂浓度的均匀性,研究了触点下方的连接质量。我们使用市售的Ag糊剂(DuPont PV159)研究了电池,并在800°,840°和930°C的炉子设定温度下进行了焙烧,结果是实际电池温度比设定温度低∲100°C,三个电池低于,最优和过度点火。我们发现,银触点下方的结的均匀性会因过度点火而大大降低,而结点在最佳和着火温度下仍保持良好的均匀性。此外,在过度烧制电池的Ag / Si界面处发现了尺寸从<100 nm到几微米的广泛分布的Ag微晶。大的微晶被成像为比结深的硅突出部分。但是,结点没有被破坏。取而代之的是,它在微晶/硅界面的整个前端进行了改造。我们提出了一种基于发射极Si在焙烧过程中在Ag-Si共晶点附近温度熔化,随后在Ag糊中掺入杂质并在淬火过程中形成晶体缺陷的再结晶机制,从而降低了结质量。

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