首页> 外文会议>Future of Electron Devices, Kansai (IMFEDK), 2012 IEEE International Meeting for >Band structure calculation of strained graphene on hexagonal boron nitride
【24h】

Band structure calculation of strained graphene on hexagonal boron nitride

机译:六方氮化硼上应变石墨烯的能带结构计算

获取原文
获取原文并翻译 | 示例

摘要

The band structure of the graphene on hexagonal boron nitride system are calculated with the ab-initio method, and the dependence on the stress applied to the direction perpendicular to the sheet are investigated. It is shown that there exists an optimal stress condition for widening the band gap of the graphene, which could greatly improve the transistor on/off ratio, while sacrificing the good on-current performance.
机译:通过ab-initio方法计算了六方氮化硼体系上石墨烯的能带结构,并研究了其对垂直于片材方向的应力的依赖性。结果表明,存在一个最佳的应力条件,可以扩大石墨烯的带隙,可以在不牺牲良好导通电流性能的同时,极大地提高晶体管的通断比。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号