【24h】

100-fs-level diode-pumped Yb-doped laser amplifiers

机译:100 fs级二极管泵浦掺Yb激光放大器

获取原文
获取原文并翻译 | 示例

摘要

Ultrashort pulse lasers with pulse duration on the level of 100 fs can be used for a variety of interesting applications that rely on multiphoton processes or ultrafast dynamics. Up to now, this field was reserved to Ti:sapphire-based laser systems that exhibit a quite complex laser architecture and relatively low laser efficiency. This may be an important reason why such applications could not yet penetrate into large scale industrial applications. We have realized an Yb-doped tungstate-based regenerative amplifier in innovative amplifier architecture. We succeeded to produce 106-fs-pulses at 70μJ and 140 fs at 40 μJ pulse energy, respectively. The average power is on the level of several Watts. The optimized management and exploitation of dispersive and nonlinear effects during the amplification process inside the regenerative amplifier cavity enabled the generation of such short pulses with excellent temporal quality and in an extremely simple and robust laser architecture that is well suited for industrial environments. Applying the same amplifier architecture to an Yb:YAG thin disk regenerative amplifier enabled the generation of pulses as short as 360-fs at high pulse energies exceeding 200 μJ and high average powers of more than 30 W.
机译:脉冲持续时间为100 fs的超短脉冲激光器可用于依赖多光子过程或超快动力学的各种有趣应用。到目前为止,该领域一直保留给基于Ti:蓝宝石的激光系统,该系统显示出非常复杂的激光架构和相对较低的激光效率。这可能是为什么此类应用尚未渗透到大规模工业应用的重要原因。我们已经在创新的放大器架构中实现了掺Yb的钨酸基再生放大器。我们分别在70μJ和40μJ的脉冲能量下成功产生了106fs的脉冲。平均功率在几瓦特的水平上。再生放大器腔体内放大过程中色散和非线性效应的优化管理和利用,使得这种短脉冲的产生具有出色的时间质量,并且采用非常简单且坚固的激光架构,非常适合工业环境。将相同的放大器架构应用于Yb:YAG薄盘再生放大器,可以在超过200μJ的高脉冲能量和超过30 W的高平均功率下产生短至360-fs的脉冲。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号