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Formation of High-Purity Zircon Powder from Amorphous ZrO_2 and Amorphous SiO_2

机译:由非晶态ZrO_2和非晶态SiO_2形成高纯锆石粉

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摘要

The preparation of high-purity zircon powder from an equimolar mixture of amorphous silica and amorphous zirconia was studied using ZrOCl_2 and S_i(OC_2H_5)_4 by the sol-gel pocess. Zircon is formed at temperature as low as 1200 deg C without any additives, predominantly from amorphous silica and tetragonal zirconia. When zircon seeds are added, formation temperature can be dropped more than 150 deg C. It is inferred fro mthe analysis of the evolution of crystal phase and the calculationof activation energies that the formation mechanism of zircon varies over different temperature range. At low temperature, zircon formation is controlled by the nucleation process, while at higher temperature, is controlled by the diffusion of SiO_2(or Si~4+) through the thin film formed between SiO_2 and ZrO_2.
机译:通过溶胶凝胶法,用ZrOCl_2和S_i(OC_2H_5)_4研究了由非晶态二氧化硅和非晶态氧化锆等摩尔混合物制取高纯锆石粉末的方法。锆石在低至1200℃的温度下形成,没有任何添加剂,主要由无定形二氧化硅和四方氧化锆形成。当添加锆石晶种时,其形成温度可下降超过150℃。通过对晶相的演变分析和活化能的计算可以推断,锆石的形成机理在不同温度范围内会发生变化。在低温下,锆石的形成受成核过程控制,而在较高温度下,由SiO_2(或Si〜4 +)通过在SiO_2和ZrO_2之间形成的薄膜扩散而控制。

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