Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami 090-8507 Japan;
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami 090-8507 Japan;
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami 090-8507 Japan;
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami 090-8507 Japan;
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami 090-8507 Japan;
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami 090-8507 Japan;
机译:溅射气压对H_2O气氛中反应溅射制备羟基氧化镍薄膜电致变色性能的影响
机译:衬底温度对O_2和H_2O气体反应溅射制备氧化钴和羟基氧化物薄膜电致变色性能的影响
机译:O_2 + H_2O混合气体反应溅射制备氢氧化镍薄膜。
机译:用H_2O气氛反应溅射制备Ni羟基氧化物薄膜及其电致变色特性
机译:压电氧化锌薄膜的反应溅射沉积:加工,结构和性能相关。
机译:直流反应磁控溅射制备纳米结构多孔ZnO薄膜的表面性能
机译:衬底温度对氧气和水在氢气中反应溅射制备氧化钴和羟基氧化物薄膜电致变色性能的影响