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PFAS: TREATMENT OPTIONS AND SAMPLING METHODS

机译:PFAS:治疗方案和抽样方法

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摘要

The ultimate degradation product of perflurooctyl sulfonates (PFOS) in the environment is perfluorooctanesulfonic acid (PFOSA), which has been found to be extremely stable in the environment and to bioaccumulate. These chemicals have been found in animals worldwide, including remote locations such as Siberia and Antarctica, and in international blood banks. Persistence, bioaccumulation and toxicity concerns led 3M, manufacturer of >95% of PFOS, to voluntarily phase out production. The U.S Environmental Protection Agency (EPA), believing that 3M was the sole manufacturer of PFOS, issued a proposed Toxic Substances Control Act (TSCA) Significant New Use Rule (SNUR) for 90 fully fluorinated sulfonate compounds (PFAS) manufactured by 3M, which EPA refers to collectively as "PFOS". The SNTJR would have the effect of eliminating most manufacturing and importing of PFOS into the United States; TSCA Low Volume Exemptions (LVE) which would allow import of non-3M manufactured PFOS compounds have recently been denied. The vast majority of PFOS chemicals were used for more than 50 years in water-, grease- and stain-proofing applications. Prior to 2001, PFOS could be found in new clothes, furniture and carpet, and even microwavable popcorn bags. Specialty chemicals are a smaller portion of the PFOS market and the semiconductor industry is a small user of PFOS specialty chemicals. A survey conducted by the semiconductor industry identified PFOS in certain plating chemistries, Chemical Mechanical Planarization (CMP) chemicals, photoresists, developers, strippers, antireflective coatings (ARCs), buffered oxide etch (BOE) solutions, cleaning solutions, and in low dielectric constant spin on chemicals. Use of PFOS in chemically amplified resists and ARCs is critical to the properties and proper functioning of these chemicals. The PFOS issue has led semiconductor manufacturers to investigate analytical methods for determining if these substances persist in wastewater, and for industrial hygiene sampling. This paper will discuss how a semiconductor manufacturer may deal with the PFOS issue, including a review of possible waste streams, analytical methods for sampling, waste treatment options, and industrial hygiene sampling. It will also include results of industrial hygiene sampling conducted at one semiconductor manufacturing facility.
机译:在环境中全氟辛基磺酸盐(PFOS)的最终降解产物是全氟辛烷磺酸(PFOSA),已发现其在环境中极其稳定并具有生物蓄积性。这些化学物质已在世界各地的动物中发现,包括西伯利亚和南极洲等偏远地区以及国际血库中。持久性,生物蓄积性和毒性问题使全氟辛烷磺酸含量超过95%的制造商3M自愿淘汰了生产。美国环境保护署(EPA)认为3M是PFOS的唯一制造商,因此发布了拟议的《有毒物质控制法案(TSCA)重要新使用规则(SNUR)》,对3M制造的90种全氟化磺酸盐化合物(PFAS)进行了规定。 EPA统称为“ PFOS”。 SNTJR将消除大多数美国生产和进口全氟辛烷磺酸的影响;最近拒绝了允许进口非3M制造的PFOS化合物的TSCA低体积豁免(LVE)。绝大多数全氟辛烷磺酸化学品在防水,防油脂和防污应用中使用了50多年。在2001年之前,全氟辛烷磺酸可能出现在新衣服,家具和地毯,甚至是微波爆米花袋中。特种化学品在PFOS市场中所占份额较小,而半导体行业是PFOS特种化学品的小用户。半导体行业进行的一项调查确定了某些电镀化学,化学机械平坦化(CMP)化学药品,光致抗蚀剂,显影剂,剥离剂,抗反射涂层(ARC),缓冲氧化物蚀刻(BOE)溶液,清洁溶液和低介电常数的PFOS旋转化学品。在化学放大的抗蚀剂和ARC中使用PFOS对这些化学品的性能和正常运行至关重要。全氟辛烷磺酸问题已导致半导体制造商研究分析方法,以确定这些物质是否仍存在于废水中以及用于工业卫生采样。本文将讨论半导体制造商如何处理PFOS问题,包括对可能的废物流,采样的分析方法,废物处理选项以及工业卫生采样的审查。它还将包括在一个半导体制造厂进行的工业卫生采样的结果。

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