首页> 外文会议>Ferroelectric Thin Films XI >Sm Doping Effects on Electrical Properties of Sol-Gel Derived SrBi_2Ta_2O_9 Films
【24h】

Sm Doping Effects on Electrical Properties of Sol-Gel Derived SrBi_2Ta_2O_9 Films

机译:Sm掺杂对溶胶-凝胶衍生SrBi_2Ta_2O_9薄膜电性能的影响

获取原文
获取原文并翻译 | 示例

摘要

We have characterized (Sr,Sm)Bi_2Ta_2O_9 (SSBT) films fabricated by the sol-gel technique on Pt/Ti/SiO_2/Si substrates. For ferroelectric-gate FET applications, a ferroelectric film which has a small remanent polarization and a relatively large coercive field is required. It is demonstrated that Sm doping in ferroelectric SBT films is effective to reduce the remanent polarization and enhance the coercive field. Sr_(0.5)Sm_(0.2)Bi_(2.2)Ta_2O_9 films (150nm) crystallized at 850℃ exhibits good electrical properties with a remanent polarization of 1.7 μC/cm~2 and a coercive fields of 85 kV/cm. These values are suitable for ferroelectric-gate FET applications.
机译:我们已经表征了通过溶胶-凝胶技术在Pt / Ti / SiO_2 / Si衬底上制备的(Sr,Sm)Bi_2Ta_2O_9(SSBT)膜。对于铁电栅极FET应用,需要具有小的剩余极化和相对大的矫顽场的铁电膜。结果表明,在铁电SBT薄膜中掺Sm可以有效地减小剩余极化并增强矫顽场。在850℃下结晶的Sr_(0.5)Sm_(0.2)Bi_(2.2)Ta_2O_9薄膜(150nm)具有良好的电性能,剩余极化强度为1.7μC/ cm〜2,矫顽场为85 kV / cm。这些值适用于铁电栅极FET应用。

著录项

  • 来源
    《Ferroelectric Thin Films XI》|2002年|p.275-280|共6页
  • 会议地点 Boston MA(US);Boston MA(US)
  • 作者单位

    IT-21 Center, Research Institute of Electrical Communication, Tohoku University 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 物理学;
  • 关键词

  • 入库时间 2022-08-26 14:19:59

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号