Laser plasma XUV sources: a role for excimer lasers?

摘要

Abstract: Radiative characteristics of laser-plasma XUV sources are reviewed. The dependence of the main plasma parameters on the heating laser wavelength is discussed, as well as the use of application-specific excimer lasers to generate XUV radiation. A comparison is given with other XUV sources, such as electron storage rings. Examples of the application of normal- incidence multilayer XUV optics, e.g., to collimate the laser-plasma radiation or for projection lithography, are given.!