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Microfocusing VLS-grating-based beamline for advanced microscopy

机译:基于微聚焦VLS光栅的光束线,用于高级显微镜

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Abstract: A beamline combining the highest possible photon density on the sample with medium energy resolving power is under construction at the third generation storage ring ELETTRA in Trieste. It is designed to meet the requirements for the best instrumental performance of two imaging microscopes, which are going to be used for surface science research and micro- characterization of magnetic materials. The high photon density on the sample will be preserved within a rather wide photon energy range, between 20 to 1000 eV. In order to meet these requirements, building a simple while economical beamline we use a Variable Line Space (VLS) grating solution for the monochromator and adaptive plane elliptical mirrors for the re-focusing. In particular two low groove density VLS plane gratings (made by Jobin-Yvon) will cover the energy range between 20 and 1000 eV and a spherical grating will cover the lower energy (less than 20 eV) and focus the zero order light, still in grazing incidence mode. Before the monochromator, an internally cooled toroidal mirror (developed at ELETTRA) will pre-focus the radiation in different positions for the sagittal and tangential directions. After the exit slit, two different branches will host two couples of adaptive plane elliptical mirrors (developed in collaboration with S.E.S.O.) mounted in a Kirkpatrick-Baez configuration. The minimum final spot size will be of the order of 4 micrometer$+2$/ with a maximum photon density of the order of 10$+14$/ ph/sec/micrometer$+2$/. The advantage of the selected solutions and the overall expected performance will be described in detail. !9
机译:摘要:在的里雅斯特的第三代存储环ELETTRA中,正在建设一条结合了样品上尽可能高的光子密度和中等能量分辨能力的光束线。它旨在满足两个成像显微镜对最佳仪器性能的要求,这两个显微镜将用于表面科学研究和磁性材料的微表征。样品上的高光子密度将保持在20至1000 eV之间的相当宽的光子能量范围内。为了满足这些要求,构建简单而经济的光束线,我们对单色仪使用可变线空间(VLS)光栅解决方案,对重新聚焦使用自适应平面椭圆镜。特别是两个低槽密度的VLS平面光栅(由Jobin-Yvon制造)将覆盖20至1000 eV的能量范围,而球形光栅将覆盖较低的能量(小于20 eV)并聚焦零阶光,仍然处于放牧入射模式。在单色仪之前,内部冷却的环形镜(由ELETTRA开发)将辐射预聚焦在弧矢和切线方向的不同位置。出口切开后,两个不同的分支将容纳安装在Kirkpatrick-Baez配置中的两对自适应平面椭圆镜(与S.E.S.O.合作开发)。最小的最终光斑大小约为4微米+ 2 $ /,最大光子密度约为10 + 14 $ / ph / sec /微米/ + 2 $ /。将详细描述所选解决方案的优势和总体预期性能。 !9

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