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Photoionized plasmas in laboratory: a connection to astrophysics and planetary sciences

机译:实验室中的光电离等离子体:与天体物理学和行星科学的联系

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摘要

In this work photoionized plasmas were created by irradiation of atomic and molecular gases by soft X-ray and extreme ultraviolet intense radiation pulses. Two different laser-produced plasma sources, employing a low energy Nd:YAG laser system (NL 129) and a high energy iodine laser system (PALS), were used for creation of photoionized plasmas. In both cases the SXR/EUV beam irradiated the gas stream, injected into a vacuum chamber synchronously with the radiation pulse. Radiation spectra, measured for photoionized plasmas produced in Ne and Ar gases, are dominated by L-shell emission lines except the Ne plasma produced using the high energy system where K-shell emission dominates. Additionally electron density measurements were performed by laser interferometry employing a femtosecond laser system synchronized with the irradiating system. Maximum electron density for Ne plasma, induced using the high energy system, reached 2·10~(18)cm~(-3). In case of employing the low energy system a detection limit was too high for interferometric measurements, thus only an upper estimation for electron density could be made.
机译:在这项工作中,通过软X射线和极强紫外线辐射脉冲对原子和分子气体的照射产生了电离等离子体。使用低能Nd:YAG激光系统(NL 129)和高能碘激光系统(PALS)的两种不同的激光产生等离子体源用于创建光电离等离子体。在这两种情况下,SXR / EUV束均会辐射气流,并与辐射脉冲同步地注入真空室。对于在Ne和Ar气体中产生的光电离等离子体测得的辐射光谱,由L壳发射谱线控制,除了使用高能系统产生的Ne等离子体(其中K壳发射占主导)之外。另外,通过使用与照射系统同步的飞秒激光系统的激光干涉法进行电子密度测量。高能系统诱导的Ne等离子体的最大电子密度达到2·10〜(18)cm〜(-3)。在采用低能量系统的情况下,对于干涉测量而言,检测极限太高,因此只能对电子密度进行较高的估计。

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  • 来源
  • 会议地点 Prague(CZ)
  • 作者单位

    Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland;

    Institute of Plasma Physics and Laser Microfusion, 23 Hery St., 00-908 Warsaw, Poland;

    Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland;

    Institute of Plasma Physics and Laser Microfusion, 23 Hery St., 00-908 Warsaw, Poland;

    Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland;

    Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland;

    Institute of Plasma Physics and Laser Microfusion, 23 Hery St., 00-908 Warsaw, Poland;

    Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland;

    Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland;

    Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland;

    Institute of Plasma Physics ASCR, Prague, Czech Republic;

    Institute of Plasma Physics ASCR, Prague, Czech Republic;

    Institute of Plasma Physics ASCR, Prague, Czech Republic;

    Institute of Plasma Physics ASCR, Prague, Czech Republic;

    Institute of Plasma Physics ASCR, Prague, Czech Republic;

    Institute of Plasma Physics ASCR, Prague, Czech Republic;

    Institute of Plasma Physics ASCR, Prague, Czech Republic,Institute of Physics ASCR, Prague, Czech Republic;

    Institute of Plasma Physics ASCR, Prague, Czech Republic,Institute of Physics ASCR, Prague, Czech Republic;

    Institute of Plasma Physics ASCR, Prague, Czech Republic;

    Czech Technical University, Faculty of Electrical Engineering Technicka 2, 166 27, Prague 6, Czech Republic;

    Institute of Plasma Physics ASCR, Prague, Czech Republic;

    Institute of Plasma Physics ASCR, Prague, Czech Republic;

    Czech Technical University, Faculty of Nuclear Sciences and Physical Engineering, Brehova 7, 115 19 Prague 1, Czech Republic;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    laser-plasma; plasma radiation; photoionization;

    机译:激光等离子体等离子体辐射光电离;

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