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X-RAY ANALYTICAL METHODS FOR ULTRA-THIN ORGANIC FILMS

机译:超薄有机薄膜的X射线分析方法

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Three x-ray analytical methods were tested for their feasibility to determine the crystal structure of highly ordered Me-phthalocyanine (MePc) molecular films up to 30 nm. The molecular alignment of 3 nm ZnPc on ITO substrates depends on temperature and chemical passivation of the substrate. From near-edge X-ray absorption fins stucture apectroscopy the best molecular alignment was found for films on H_3PO_4 passivated ITO surface deposited at 90° substrate temperature.The thickness average of lattice distance of a-modification ZnPc a-axis perpendicular to the substrate surface is determined by XRD measurement to 1.28 nm. For p-modification c-axis a lattice distance of 1.25 is found. The full crystal profile of 37.7 nm CuPc films on oxidized Si were analyzed by x-ray reflectivity calculations fitted to experimental data. Best fit turned out to be a three layer system for Cu-Pc consisting of 3 nm disturbed molecular base on the substrate, 32.5 nm highly ordered bulk layer and 2.2 nm surface layer standing for the film roughness.
机译:测试了三种X射线分析方法在确定高达30 nm的高度有序Me-酞菁(MePc)分子膜的晶体结构方面的可行性。 ITO基板上3 nm ZnPc的分子排列取决于基板的温度和化学钝化。从近缘X射线吸收鳍片的结构分析来看,在90°衬底温度下沉积的H_3PO_4钝化ITO表面上的薄膜发现了最佳的分子取向。通过XRD测量确定为1.28nm。对于p-修饰c轴,发现晶格距离为1.25。通过拟合于实验数据的X射线反射率计算分析了氧化的Si上37.7 nm CuPc膜的全晶体轮廓。最佳拟合结果是用于Cu-Pc的三层系统,该系统由基板上的3 nm受扰分子基,32.5 nm高有序的本体层和2.2 nm表层组成,代表了膜的粗糙度。

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