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Parallel implementationin a industrial framework of statistical tolerancing analysis in microelectronics

机译:微电子学中统计公差分析的工业框架中的并行实现

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The aim of this work is to report on a parallel implementation of methods for tolerance analysis in the framework of a microelectronics design center.The methods were designed to run parallelly on different platforms which could have different computational performances.In order to distributed the computations over a network of workstations,the algorithm was designed not by using a parallel compiler,but by using a RPC multi-server network.We have used essentially two methods.This first is the Monte Carlo approach,the second is based on an approximation by numerical integration or quadrature technique[1,2,3,4],which requires far less function evaluations than the Monte Carlo method.These two approaches have been implemented in a parallel algorithm to be used on a cluster of multivendor workstations.
机译:这项工作的目的是报告在微电子设计中心框架内并行执行公差分析方法的方法,这些方法旨在在可能具有不同计算性能的不同平台上并行运行。一个工作站网络,该算法不是通过并行编译器设计的,而是通过RPC多服务器网络设计的。我们基本上使用了两种方法。第一种是蒙特卡洛方法,第二种是基于数值近似集成或正交技术[1,2,3,4],其功能评估要比蒙特卡洛方法少得多。这两种方法已在并行算法中实现,可用于多厂商工作站集群。

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