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PLASMA-DESITY MEASUREMENTS BY MICROWAVE INTERFEROMETER AND LANGMUIR PROBE IN A STEADY-STATE PLASMA COLUMN

机译:稳态等离子体柱中微波干扰物和朗格探针的等离子体测量

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In the paper, a Langmuir probe and a microwave interferometer have been combined to measure the electron density of DC high-voltage discharge of argon in a steady-state plasma column. The two techniques show good agreements with the discrepancy within 20% at pressures of 0.0 1Pa and 0.lPa. With the increasing of pressure, the mean free path of ions ( λ_i ) begins to approach the Debye length (λ_D ) and the collection of ions and indeed electrons become influenced by collisions. At pressure up to 10Pa, the influence of collision cannot be ignored. Electron densities determined from interferometer are 3-5 times than the uncorrected electron densities determined from the Langmuir probe at pressure of 15-30Pa. The corrected electron densities track well with those determined by interferometer. However the values are off by approximately 60%.
机译:本文将Langmuir探头和微波干涉仪组合在一起,以测量稳态等离子体柱中氩气直流高压放电的电子密度。两种技术显示出良好的一致性,在0.0 1Pa和0.1Pa的压力下,差异在20%以内。随着压力的增加,离子的平均自由程(λ_i)开始接近德拜长度(λ_D),并且离子的收集以及实际上电子受到碰撞的影响。在高达10Pa的压力下,碰撞的影响不可忽略。在15-30Pa的压力下,用干涉仪测得的电子密度是用Langmuir探针测得的未校正电子密度的3-5倍。校正后的电子密度与干涉仪所确定的密度一致。但是,这些值相差大约60%。

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