首页> 外文会议>Electronic Packaging Technology amp; High Density Packaging, 2009. ICEPT-HDP '09 >Novel Pore-sealing of Ordered, Porous Silica, SBA-15 for Low-k Underfill Materials
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Novel Pore-sealing of Ordered, Porous Silica, SBA-15 for Low-k Underfill Materials

机译:用于低k底部填充材料的有序多孔二氧化硅SBA-15的新型孔密封

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摘要

Underfill materials, consisting of organic resin and inorganic filler, have been widely employed in flip-chip technology for preventing the failure of solder joints during packaging process. In order to meet the requirements of high frequency device applications, low-dielectric-constant underill is highly desired to alleviate the power consumption issue. However, it is disadvantageous to introduce low-k into organic resin because of its high cost and low volume fraction. Alternative approach is to use highly porous silica filler with appropriate pore sealing prior to mixing with epoxy. In this paper, a siloxane compound, polymerized vinyl-trimethoxysilane (poly-VSQ), was synthesized and applied to an ordered, porous silica structure, SBA-15 to study its effectiveness in pore sealing and interaction with SBA-15 matrix for low-k underfill applications. We have developed a convenient pore sealing treatment using poly-VSQ to achieve a 10.9% reduction (from 3.2 to 2.85) in dielectric constant of underfill material with 15% filler content by fully retaining the high porosity (61%) of SBA15. Moreover, excellent mechanical strength could be maintained as 3.0GPa without any interfacial delamination.
机译:由有机树脂和无机填料组成的底部填充材料已广泛用于倒装芯片技术中,以防止在封装过程中出现焊点失效。为了满足高频设备应用的要求,迫切需要低介电常数的底衬以减轻功耗问题。然而,将低k引入有机树脂中是不利的,因为其成本高且体积分数低。另一种方法是在与环氧树脂混合之前,使用具有适当孔密封的高度多孔的二氧化硅填料。本文合成了一种硅氧烷化合物聚合的乙烯基三甲氧基硅烷(poly-VSQ),并将其应用于有序的多孔二氧化硅结构SBA-15,以研究其在孔密封和与SBA-15基质相互作用方面的有效性,从而降低了k底部填充应用程序。我们已经开发出一种使用聚-VSQ的便捷的孔密封处理方法,通过充分保留SBA15的高孔隙率(61%),使填充含量为15%的底部填充材料的介电常数降低10.9%(从3.2降低到2.85)。此外,优异的机械强度可以保持为3.0GPa,而不会发生任何界面分层。

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  • 来源
  • 会议地点 Beijing(CN)
  • 作者单位

    Department of Materials Science and Engineering, Chiao-Tung University, Taiwan, China1001 University Road, Hsinchu, Taiwan 30049;

    Department of Materials Science and Engineering, Chiao-Tung University, Taiwan, China1001 University Road, Hsinchu, Taiwan 30049;

    Synchrotron Radiation Research Center101 Hsin-Ann Raod, Hsinchu Science Park, Hsinchu, Taiwan 30076;

    Synchrotron Radiation Research Center101 Hsin-Ann Raod, Hsinchu Science Park, Hsinchu, Taiwan 30076;

    Department of Materials Science and Engineering, Chiao-Tung University, Taiwan, China 1001 University Road, Hsinchu, Taiwan 30049;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 包装工程 ;
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