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Pulse Electrodeposited ZnSeTe Films

机译:脉冲电沉积ZnSeTe薄膜

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摘要

ZnSe_xTe_(1-x) films were deposited by pulse electrodeposition technique for the first time. The films exhibited cubic structure, with lattice parameter increasing from 0.579 to 0.605 ran as the Te content increased. Band gap values in the range of 2.35 eV - 2.69 eV are observed as the ZnSe concentration increased. Refractive index was found to vary from 2.83 - 2.53 with increase of'x' value. Raman spectra exhibit the ZnSe like LO phonons. Photoluminescence spectra of ZnSe_(1-x)Te_x films with different tellurium content confirms that the Te isovalent impurities exactly replace the Se atoms whose electronic configurations are the same.
机译:首次通过脉冲电沉积技术沉积ZnSe_xTe_(1-x)薄膜。薄膜呈现立方结构,随着Te含量的增加,晶格参数从0.579nm增加到0.605nm。随着ZnSe浓度的增加,带隙值在2.35 eV-2.69 eV范围内。发现折射率随“ x”值的增加而在2.83-2.53之间变化。拉曼光谱表现出类似于ZnSe的LO声子。碲含量不同的ZnSe_(1-x)Te_x薄膜的光致发光光谱证实,Te等价杂质完全取代了电子构型相同的Se原子。

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