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Deposition and Characterization of Copper Chalcopyrite Based Solar Cells using Electrochemical Techniques

机译:电化学技术沉积和表征铜黄铜矿基太阳能电池

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摘要

Cu(In,Ga)Se_2 films were electrodeposited on molybdenum substrates from a single pH buffered bath and annealed in a reducing selenium atmosphere. The opto-electronic properties of the films were characterized using a potentiostatically-controlled three electrode setup and an electrolyte contact. Pulsed illumination was used to determine the carrier type and the speed of photoresponse. Chopped monochromatic illumination was used to measure photocurrent spectra. The electrodeposited copper chalcopyrite films were compared with films prepared by sputtering and spraying techniques. All electrodeposited films gave p-type photoresponses, and the sputtered film had the highest photocurrent. Optimum cyanide etch times to illicit the maximum photocurrent response were different for each material. The band gap of electrodeposited CuInSe_2 was 0.95 eV, which was slightly lower than that of the sputtered film. The electrodeposited Cu(In,Ga)Se_2 material gave a smaller photo-response but its band gap appeared to be similar to that of CuInSe_2. The best device based on an electrodeposited absorber layer had an efficiency of 4.5 %.
机译:从单个pH缓冲浴中将Cu(In,Ga)Se_2薄膜电沉积在钼基板上,并在还原硒气氛中进行退火。使用恒电位控制的三电极设置和电解质触点来表征薄膜的光电性能。脉冲照明用于确定载流子类型和光响应速度。切碎的单色照明用于测量光电流谱。将电沉积铜黄铜矿膜与通过溅射和喷涂技术制备的膜进行比较。所有的电沉积膜都具有p型光响应,并且溅射的膜具有最高的光电流。每种材料用于获得最大光电流响应的最佳氰化物蚀刻时间都不相同。电沉积的CuInSe_2的带隙为0.95eV,略低于溅射膜的带隙。电沉积的Cu(In,Ga)Se_2材料产生较小的光响应,但其带隙似乎与CuInSe_2相似。基于电沉积吸收层的最佳器件的效率为4.5%。

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