首页> 外文会议>Electro-optical remote sensing, photonic technologies, and applications VI >Latest developments in AlGalnN laser diode technology for defence applications.
【24h】

Latest developments in AlGalnN laser diode technology for defence applications.

机译:用于国防应用的AlGalnN激光二极管技术的最新发展。

获取原文
获取原文并翻译 | 示例

摘要

The latest developments in AlGalnN laser diode technology are reviewed for defence applications such as underwater telecommunications, sensor systems, datacom etc. The AlGalnN material system allows for laser diodes to be fabricated over a very wide range of wavelengths from u.v. to the visible, i.e., 380-530nm, by tuning the indium content of the laser GalnN quantum well. Ridge waveguide laser diode structures are fabricated to achieve single mode operation with optical powers of >100mW in the 400-420nm wavelength range. Low defectivity and highly uniform TopGaN and Ammono GaN-substrates allow arrays and bars of nitride lasers to be fabricated. In addition, high power operation of AlGalnN laser diodes is demonstrated with the operation of a single chip, 'mini-array' consisting of a 3 stripe common p-contact at powers up to 2.5W cw in the 408-412 nm wavelength range and a 16 stripe common p-contact laser array at powers over 4W cw.
机译:对AlGalnN激光二极管技术的最新发展进行了综述,以用于国防应用,例如水下电信,传感器系统,数据通信等。AlGalnN材料系统允许在非常宽的波长范围内制造激光二极管。通过调节激光GalnN量子阱的铟含量达到可见光,即380-530nm。脊形波导激光二极管结构经制造可在400-420nm波长范围内以> 100mW的光功率实现单模运行。低缺陷率和高度均匀的TopGaN和Ammono GaN衬底允许制造氮化物激光器的阵列和棒。此外,AlGalnN激光二极管的高功率操作通过单芯片“微型阵列”的操作进行了演示,该微型阵列由3条纹公共p触点组成,在408-412 nm波长范围内的功率高达2.5W cw,并且一个16条纹的普通p接触激光器阵列,功率超过4W cw。

著录项

  • 来源
  • 会议地点 Edinburgh(GB)
  • 作者单位

    TopGaN Ltd., ul. Sokolowska 29/37, 01-142 Warsaw, Poland.;

    TopGaN Ltd., ul. Sokolowska 29/37, 01-142 Warsaw, Poland. Institute of High Pressure Physics PAS, ul. Sokolowska 29/37, 01-142 Warsaw, Poland.;

    Institute of High Pressure Physics PAS, ul. Sokolowska 29/37, 01-142 Warsaw, Poland.;

    Institute of High Pressure Physics PAS, ul. Sokolowska 29/37, 01-142 Warsaw, Poland.;

    TopGaN Ltd., ul. Sokolowska 29/37, 01-142 Warsaw, Poland. Institute of High Pressure Physics PAS, ul. Sokolowska 29/37, 01-142 Warsaw, Poland.;

    TopGaN Ltd., ul. Sokolowska 29/37, 01-142 Warsaw, Poland. Institute of High Pressure Physics PAS, ul. Sokolowska 29/37, 01-142 Warsaw, Poland.;

    TopGaN Ltd., ul. Sokolowska 29/37, 01-142 Warsaw, Poland. Institute of High Pressure Physics PAS, ul. Sokolowska 29/37, 01-142 Warsaw, Poland.;

    TopGaN Ltd., ul. Sokolowska 29/37, 01-142 Warsaw, Poland. Institute of High Pressure Physics PAS, ul. Sokolowska 29/37, 01-142 Warsaw, Poland.;

    Ammono S.A., Czerwonego Krzyza 2/31, 00-377 Warsaw, Poland;

    TopGaN Ltd., ul. Sokolowska 29/37, 01-142 Warsaw, Poland.;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    GaN laser; GaN array;

    机译:氮化镓激光器氮化镓阵列;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号