首页> 外文会议>Eighth International Conference on Photorefractive Effects, Materials, and Devices, Jul 8-12, 2001, Delavan, Wisconsin >Temporal and spatial evolution of beam coupling in Bi_(12)SiO_(20) under an applied electric field in two wave mixing
【24h】

Temporal and spatial evolution of beam coupling in Bi_(12)SiO_(20) under an applied electric field in two wave mixing

机译:两次电场作用下Bi_(12)SiO_(20)中电子束耦合时空演化

获取原文
获取原文并翻译 | 示例

摘要

Temporal and spatial evolution of beam coupling in two-wave mixing under an applied electric field was calculated numerically for bismuth silicon oxide. A new and powerful method to calculate the intensities of the two light beams interacting along the crystal during grating formation was developed. To accomplish this modeling the band transport model at both low and high modulation depths was solved to obtain the temporal evolution of the space charge field and the phase mismatch of photorefractive grating with regard to light illumination pattern. These quantities were used to calculate the coupling gain coefficients required to solve also numerically the coupling equations governing the energy exchange between the beams intensities traveling through the crystal. An unusual non-monotonous effect on time evolution of the intensities of light beam was observed. The intensities show an anomalous variation before to attain its steady state level.
机译:数值计算了铋氧化硅在电场作用下两波混合中束耦合的时空演化。开发了一种新的强大的方法来计算光栅形成过程中沿晶体相互作用的两条光束的强度。为了完成该建模,求解了在低调制深度和高调制深度的带传输模型,以获得了空间电荷场的时间演化以及光折射光栅相对于光照图案的相位失配。这些量用于计算耦合增益系数,该耦合增益系数还需要在数值上求解控制通过晶体的光束强度之间的能量交换的耦合方程。观察到光束强度随时间变化的异常非单调效应。在达到其稳态水平之前,强度显示出异常变化。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号