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Synthesis and Characterization of Sn doped SiO_2 by Reverse Micelle and Sol-Gel Process

机译:反向胶束和溶胶-凝胶法合成Sn掺杂SiO_2及其表征

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Sn doped SiO_2 nanoparticles have been synthesized using a reverse micelle technique combined with metal alkoxide hydrolysis and condensation. The size of the particles and the thickness of the coating can be controlled by manipulating the relative rates of the hydrolysis and condensation reactions of tetraethyl orthosilicate(TEOS) within the micro-emulsion. The properties of the Sn doped SiO_2 nanoparticles were studied as a function of various processing parameters such as R and H value. The average size of synthesized Sn doped SiO_2 nanoparticles was about in the size range of 20-40 nm and core particle(Sn) 1-5 nm. The Sn doped SiO_2 nanoparticles were characterized by X-ray diffraction (XRD) and Transmission electron microscopy (TEM).
机译:使用逆胶束技术结合金属醇盐的水解和缩合反应合成了Sn掺杂的SiO_2纳米颗粒。可以通过控制微乳液中原硅酸四乙酯(TEOS)的水解和缩合反应的相对速率来控制颗粒的大小和涂层的厚度。研究了Sn掺杂的SiO_2纳米颗粒的性能与各种加工参数(例如R和H值)的关系。合成的Sn掺杂的SiO_2纳米颗粒的平均尺寸约为20-40 nm,核心颗粒(Sn)1-5 nm。通过X射线衍射(XRD)和透射电子显微镜(TEM)表征了Sn掺杂的SiO_2纳米颗粒。

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