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Whisker Formation in Pb-Free Surface Finishes

机译:无铅表面处理中的晶须形成

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摘要

Tin-lead (Sn-Pb) alloys have been used extensively for surface finishing of electronic components in part because Pb was found to be effective in retarding Sn whisker growth in electrodeposits. Although whiskers appear to be a local response to the existence of residual compressive stress in the electrodeposited film, questions remain as to the dominant source of stress and the precise growth mechanism. Using both deflection measurements of plated cantilever beams and x-ray diffraction methods (siN_2Ψ), we have determined the in-plane residual stress in Sn, Sn-Cu, and Sn-Pb alloys electrodeposited from both bright- and matte-finish methanesulfonate-based electrolytes. Stress measurements were made soon after deposition and as a function of time. The appearance of hillocks and/or whiskers following plating is influenced by several factors such as intrinsic growth stress, stress induced by Cu_6Sn_5 formation at the Sn-Cu interface, and the deposit microstructure.
机译:锡铅(Sn-Pb)合金已被广泛用于电子零件的表面处理,部分原因是发现Pb可以有效地抑制电沉积中锡晶须的生长。尽管晶须似乎是对电沉积膜中残余压应力的局部响应,但仍存在关于应力的主要来源和精确的生长机理的问题。使用镀层悬臂梁的挠度测量和X射线衍射方法(siN_2Ψ),我们确定了由亮和哑光甲磺酸盐电沉积的Sn,Sn-Cu和Sn-Pb合金的面内残余应力。电解液。沉积后不久并随时间变化进行应力测量。电镀后小丘和/或晶须的出现受到多种因素的影响,例如固有生长应力,由Sn-Cu界面处的Cu_6Sn_5形成引起的应力以及沉积物的微结构。

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