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Gold-hydrogen complexes in silicon

机译:硅中的金氢络合物

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Electron emission from gold and gold-hydrogen complexes in n-type silicon have been studied using high resolution (Laplace) DLTS. This technique permits a clear separation of defects which have very similar carrier emission characteristics. At low hydrogen concentrations our results confirm those inferred previously from conventional DLTS. However by using 'Laplace' DLTS it has been possible to study the gold acceptor and G4 defect independently. G4 has an activation energy of 542+-8 meV. By directly measuring the electron capture cross-section of G4 we conclude that it is acceptor like. At high hydrogen concentrations additional complexes are formed, notably a defect with emission characteristics similar to G4 (referred to as G4') with an activation energy of 578+-10 meV, and a state with an activation energy for electron emission of 276 5 meV. We put forward the hypothesis that these may be charge states of AuH_2 or AuH_3 complexes. direct c 1999 Elsevier Science S.A. All rights reserved.
机译:已经使用高分辨率(拉普拉斯)DLTS研究了n型硅中金和金氢络合物的电子发射。该技术可以清晰地分离出具有非常相似的载流子发射特性的缺陷。在低氢浓度下,我们的结果证实了以前从常规DLTS推断的结果。但是,通过使用“ Laplace” DLTS,可以独立研究金受体和G4缺陷。 G4具有542 + -8meV的活化能。通过直接测量G4的电子俘获截面,我们得出结论,它像受体一样。在高氢浓度下,会形成其他配合物,特别是具有类似于G4的发射特性的缺陷(称为G4'),其激活能为578 + -10 meV,电子发射的激活能为276 5 meV。 。我们提出了这些可能是AuH_2或AuH_3配合物的电荷状态的假设。直接c 1999 Elsevier Science S.A.保留所有权利。

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