首页> 外文会议>Defect recognition and image processing in semiconductors and devices >Macroscopic and microscopic characterization of residual strains in LEC-grown III-V compound wafers
【24h】

Macroscopic and microscopic characterization of residual strains in LEC-grown III-V compound wafers

机译:LEC生长的III-V型复合晶片中残余应变的宏观和微观表征

获取原文
获取原文并翻译 | 示例

摘要

Macroscopic and microscopic characterizations of residual strains in commercial LEC-grown III-V compound wafers, mainly in GaP wafers, with standard dimensions have been made by measuring strain-induced birefringence. The macroscopic characterization was made in a series of wafers systematically sliced from a crystal ingot to investigate the distribution of residual strains in the whole crystal ingot, relating to thermal stresses during crystal growth, while the microscopic characterization was made with a high spatial resolution to investigate the local distribution of residual strains, relating to crystal defects.
机译:通过测量应变引起的双折射,可以对商用LEC生长的III-V复合晶片(主要是GaP晶片)中的残余应变进行宏观和微观表征,并具有标准尺寸。在从晶锭系统地切下的一系列晶片中进行宏观表征,以研究整个晶锭中残余应变的分布,这与晶体生长过程中的热应力有关,而微观表征则以高空间分辨率进行研究。残余应变的局部分布,与晶体缺陷有关。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号