首页> 外文会议>Damage to VUV, EUV, and X-ray optics IV; and EUV and X-ray optics: synergy between laboratory and space III >Non-thermal phase transitions in semiconductors under femtosecond XUV irradiation
【24h】

Non-thermal phase transitions in semiconductors under femtosecond XUV irradiation

机译:飞秒XUV照射下半导体的非热相变

获取原文
获取原文并翻译 | 示例

摘要

When a semiconductor or a dielectric is irradiated with ultrashort intense X-ray pulse, several processes occur: first the photoabsorption brings the electron subsystem out of equilibrium, bringing valence or deeper shells electrons into high energy states of the conduction band. Then, secondary electron cascading promotes further electrons of the valence to conduction band increasing their number there. These electrons also influence the atomic motion, modifying the interatomic forces. This process is known as a nonthermal melting. It can turn a material into a new phase state on ultrashort timescales. Recently developed hybrid model for treating all of these processes with different computational tools was reported in [N. Medvedev et al, New J. Phys. 15, 015016 (2013)]. Based on this model, we present here further investigations of nonthermal processes occurring in diamond under irradiation with a FLASH pulse of 10 fs FWHM and 92 eV photon energy. It is shown that the diamond turns into graphite under such irradiation, independently whether constant pressure or constant volume modeling is performed. However, for the latter case, the time of the nonthermal phase transition is longer (few tens of fs for P=const vs few hundreds of fs for V=const) and the damage threshold is slightly higher (0.69 eV/atom vs 0.74 eV/atom, correspondingly).
机译:当用超短的强X射线脉冲照射半导体或电介质时,会发生几个过程:首先,光吸收使电子子系统失去平衡,使价电子或更深的电子进入导带的高能态。然后,二次电子级联将价电子进一步带入导带,从而增加在那里的数量。这些电子还会影响原子运动,从而改变原子间力。此过程称为非热熔化。它可以在超短时间尺度上将材料转变为新的相态。 [N.报道了最近开发的用不同的计算工具处理所有这些过程的混合模型。 Medvedev等人,New J. Phys。 15,015016(2013)]。基于此模型,我们在此进一步研究钻石在10 fs FWHM和92 eV光子能量的FLASH脉冲照射下发生的非热过程。结果表明,无论是进行恒压还是恒定体积建模,钻石都在这种照射下变成石墨。但是,对于后一种情况,非热相变的时间更长(P = const为几十fs,V = const为数百fs),损伤阈值略高(0.69 eV / atom vs 0.74 eV) / atom)。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号