FEL multilayer optics damaged by multiple shot laser beam: experimental results and discussion

摘要

The irradiation effects of multiple ultrafast shots of laser beams with estimated fluences of some tens of mJ/cm2 on a EUV Mo/Si multilayer have been studied. Irradiation damage has been induced by multiple shots of two different lasers (100 fs 400 nm the first, 1.5 ns 46.9 nm the second). The study has been motivated by the need of multilayer Mo/Si optics for the delay lines of the FEL source FERMI@Elettra, where these mirrors will be used to reflect 100 fs pulses at 13 nm with a fluence of some mJ/cm2. The analysis has been performed by means of different techniques as EUV and soft X-ray reflectivity, XPS, and Standing wave enhanced XPS. Simulations have been carried on by means of an indigenously developed software OPAL (Optical Properties of Anisotropic Layers) for the calculation of the absorbed energy by the stratified medium. AFM and SEM surface images have been also acquired. In the irradiation at 400 nm, we observed a significant change in the multilayer performance at fluences of 100 mJ/cm2 and above with a significant reduction of reflectivity. Spectroscopic analysis allowed to correlate the decrease of reflectivity with the degradation of the multilayer stacking, ascribed to Mo-Si intermixing at the Mo/Si interfaces of the first few layers, close to the surface of the mirror. Preliminary tests have been also performed on the sample irradiated at 46.9 nm.