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Full-field mapping and analysis of veiling glare sources forhelmet-mounted display systems,

机译:用于头盔安装式显示系统的面纱眩光源的全场映射和分析,

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Abstract: The performance of an optical system can be degraded by the intrusion of stray light form sources both inside and outside of the system field of view. Stray light, or 'veiling glare,' can be particularly distracting in visual systems such as Helmet Mounted Display (HMD) systems. This paper describes techniques used by the authors to map stray light sources positions in the far field for HMD systems and to quantitatively define their impact. The mapping can be performed over 4$pi steradians both inside and outside the system field of view. Monte-Carlo ray tracing algorithms are utilized for determining that separates the veiling glare component from the desired optical signal components. Once the major veiling glare source positions are identified, methods to reduce veiling glare can be determined. A technique for reducing noise in the calculation due to the statistical nature of the Monte Carlo ray trace is also discussed. !2
机译:摘要:杂散光从光源进入系统内部和外部都会降低光学系统的性能。杂散光或“遮盖眩光”在视觉系统(例如头盔显示器(HMD))中可能会特别分散注意力。本文介绍了作者用来绘制HMD系统远场杂散光源位置并定量定义其影响的技术。可以在系统视域之内和之外对4 $ pi球面度执行映射。蒙特卡洛射线追踪算法用于确定将遮盖眩光分量与所需的光信号分量分开。一旦确定了主要的遮盖眩光源位置,就可以确定减少遮盖眩光的方法。还讨论了一种由于蒙特卡洛射线迹线的统计特性而在计算中减少噪声的技术。 !2

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