首页> 外文会议>Conference on smart materials V; 20081210-12; Melbourne(AU) >Low-temperature processing of PZT thin films by 2.45 GHz microwave heating
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Low-temperature processing of PZT thin films by 2.45 GHz microwave heating

机译:通过2.45 GHz微波加热对PZT薄膜进行低温处理

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摘要

The effect of microwave heating with a frequency of 2.45 GHz on the low-temperature crystallization of Pb(Zr_xTi_(1-x))O_3 (PZT) films was investigated. PZT thin films were coated on Pt/Ti/SiO_2/Si substrates by the sol-gel method and then crystallized by single-mode 2.45 GHz microwave irradiation in the magnetic field. The elevated temperature generated by microwave heating used to obtain the perovskite phase was only 450℃, which is significantly lower than that of conventional thermal processing. The PZT films crystallized by microwave heating at 450℃ showed similar ferroelectric properties to those of the films crystallized by conventional thermal processing at 600℃. The average remanent polarization and coercive field of the PZT films are approximately 21 μC/cm~2 and 90 kV/cm, respectively. It is clear that single-mode microwave irradiation in the magnetic field is effective for obtaining perovskite PZT thin films at low temperatures.
机译:研究了频率为2.45 GHz的微波加热对Pb(Zr_xTi_(1-x))O_3(PZT)薄膜低温结晶的影响。通过溶胶-凝胶法将PZT薄膜涂覆在Pt / Ti / SiO_2 / Si衬底上,然后在磁场中通过单模2.45 GHz微波辐射使其结晶。用于获得钙钛矿相的微波加热产生的高温仅为450℃,明显低于常规热处理的温度。通过在450℃下微波加热结晶的PZT薄膜具有与通过在600℃下常规热处理结晶的薄膜相似的铁电性能。 PZT薄膜的平均剩余极化强度和矫顽场分别约为21μC/ cm〜2和90 kV / cm。显然,磁场中的单模微波辐射对于在低温下获得钙钛矿型PZT薄膜是有效的。

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