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Three-dimensional recording by femtosecond pulses in dielectrics

机译:飞秒脉冲在电介质中进行三维记录

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摘要

Fabrication and characteristics of two-dimensional (2D) and three-dimensional (3D) periodic structures, recorded in the bulk of SU8 photoresist film by multiple-beam interference is described. Multiple beams (up to nine) were generated by a diffractive beam splitter. Recording was performed by ultrashort laser pulses with temporal width of 140 fs (FVWM) and central wavelength of 800 nm, derived from a Ti:sapphire laser. Intensity-dependent photomodification of the photoresist was due to single-photon as well as multi-photon (two and three) absorption. After the development, the exposed resist films contained free-standing 2D and 3D periodic dielectric structures with unexposed exposed regions removed by the development. Detailed examination of the samples has revealed close resemblance between their structure and the light intensity distributions in the multiple-beam interference fields, expected from the numerical calculations. Quality of the samples recorded by a single-photon absorption was lower than that of that of other samples, in particular due to poor development quality. The microfabrication method used in this work appears to be a suitable for obtaining photonic, crystal templates.
机译:描述了通过多束干涉记录在SU8光致抗蚀剂薄膜主体中的二维(2D)和三维(3D)周期性结构的制造和特性。衍射分束器产生多束光束(最多九束)。通过从Ti:蓝宝石激光器获得的超短激光脉冲进行记录,其时间宽度为140 fs(FVWM),中心波长为800 nm。光致抗蚀剂的强度依赖的光改性是由于单光子以及多光子(两个和三个)的吸收。显影后,曝光的抗蚀剂膜包含独立的2D和3D周期性电介质结构,未显影的曝光区域被显影除去。对样品的详细检查发现,其结构与多光束干涉场中的光强度分布非常相似,这是数值计算所期望的。单光子吸收记录的样品质量低于其他样品,特别是由于显影质量差。在这项工作中使用的微细加工方法似乎适合于获得光子晶体模板。

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