Absorption limited performance of SiO_2/Al_2O_3 multi-layer coatings at 193nm - a systematic study

机译：SiO_2 / Al_2O_3多层涂层在193nm处的吸收受限性能-系统研究

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The optical performance and radiation stability of HR193nm - SiO_2/Al_2O_3 -coatings deposited by different technologies (RE, PIAD, IBS) were systematically evaluated and causes for the low LIDT at 193nm compared to 248nm were investigated.

机译：系统地评估了不同技术（RE，PIAD，IBS）沉积的HR193nm-SiO_2 / Al_2O_3-涂层的光学性能和辐射稳定性，并研究了193nm与248nm相比LIDT低的原因。

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来源
《Conference on Optical Interference Coatings: Postconference Digest, Jul 16-20, 2001》|2001年|p.THA6.1-6.3|共3页
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作者
R. Thielsch; J. Heber; N. Kaiser; O. Apel; K. Mann; D. Ristau; H. Blaschke; W. Arens;
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Fraunhofer Institut fuer angewandte Optik und Feinmechanik, Schillerstr. 1, D-07745 Jena, Germany;

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原文格式 PDF
正文语种 eng
中图分类化学工业;
关键词
thin films; thin films, optical properties; materials and process characterization;

机译：薄膜；薄膜，光学性能；材料和工艺表征;
入库时间 2022-08-26 14:12:21

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Absorption limited performance of SiO_2/Al_2O_3 multi-layer coatings at 193nm - a systematic study

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