An Investigation on Photodamage of Zn:In:LiNbO_3 Crystal Waveguide Substrate

摘要

In this research, Czochralski method was used to grow Zn:In:LiNbO_3 crystal. The lattice constants, ultra-visible absorption spectra, infrared absorption spectra and photodamage resistance ability of the crystal were measured. The photodamage threshold of LiNbO_3 and Zn:In:LiNbO_3 crystal wave-guide substrate were investigated by the m-line method. It is found that the higher the concentrations of In and Zn were doped, the more the absorption band of crystal was shifted to short wave. The OH absorption peak of Zn(3mol%):In(2mol%):LiNbO_3 and Zn(3mol%):In(lmol%):LiNbO_3 crystal was located at about 3484cm~(-1), and that of Zn(3mol%):In(3mol%): LiNbO_3 crystal was located at about 3515cm~(-1). The photodamage resistance ability of Zn(3mol%):In(2mol%): LiNbO_3 crystal was two orders of magnitude higher than that of LiNbO_3 crystal. The photodamage threshold of LiNbO_3 crystal waveguide substrate and Zn:In:LiNbO_3 crystal wave-guide substrate were 5x 10~3J/cm~2 and 1 x 10~6J/cm~2, respectively.