THE EMERGING ROLE OF NANOCRYSTALLINE CERIA IN MICROELECTRONIC GLASS POLISHING APPLICATIONS

摘要

Nanophase Technologies Corporation has developed a new ceria particle and dispersion technology to improve the surface roughness with reduced incidents of defectivity in advance polishing applications. The new ceria particles are smaller, more active, and have tighter particle size distributions; the new dispersion technology has improved product consistency and high purity. Commercially available ceria dispersions will be described with attention given to differentiating characteristics that enable polishing applications.