首页> 外文会议>Conference on Micro- and Nanoelectronics; 20031006-20031010; Zvenigorod; RU >The influence of classical and quantum-mechanical regions interaction on Ⅳ- characteristics of RTD, based on different materials
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The influence of classical and quantum-mechanical regions interaction on Ⅳ- characteristics of RTD, based on different materials

机译:基于不同材料的经典和量子力学区域相互作用对RTDⅣ特征的影响

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摘要

The effect of influence of different material parameters and structure design on Ⅳ- characteristic of RTD is considered in the paper. Special attention was paid to analysis of the interaction between classical and quantum-mechanical RTD regions. The combined numerical model of a resonant-tunneling diode, based on self-consistent solution of the Schroedinger and Poisson equations is presented. The interface charge was added to the Poisson equation and its approximation is also given. The simulation of Ⅳ-characteristics of RTD on In_(0.53)Ga_(0.47)As/AlAs and GaAs/AlAs was carried out by using the combined model and model modifications. As a confirmation of accuracy and adequacy of the proposed model there was achieved a good agreement between theoretical and experimental results. The effect of interface charge and sizes of the active regions on Ⅳ-characteristics of RTDs was also studied.
机译:本文考虑了不同材料参数和结构设计对RTDⅣ特性的影响。特别注意分析经典和量子力学RTD区域之间的相互作用。提出了基于薛定inger方程和泊松方程自洽解的谐振隧道二极管组合数值模型。界面电荷被添加到泊松方程中,并且也给出了它的近似值。通过组合模型和模型修正,对RTD的In_(0.53)Ga_(0.47)As / AlAs和GaAs / AlAs的Ⅳ特性进行了仿真。为了证实所提出模型的准确性和充分性,在理论和实验结果之间取得了良好的一致性。还研究了界面电荷和活性区尺寸对RTDsⅣ特性的影响。

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