The loss measurement of oxidised porous silicon optical waveguides by nondestructive end-fire coupling

摘要

The oxidised porous silicon channel waveguides were fabricated by controlling the illumination intensities and anodisation time during anodisation process is reported in this paper. By the technique combined the optimisation end-fire coupling and cut-back methods, the relatively exact results of measured propagation loss, endface's scattering loss and the mode mismatching loss of oxidised porous silicon channel waveguides were 12.5.2dB/cm, 4.6dB and 3.1dB respectively.