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Maskless Lithography Using Drop-On-Demand InkJet Printing Method

机译:使用按需喷墨印刷方法进行无掩模光刻

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摘要

Writing process patterns directly on a substrate with small liquid droplets generated by Drop-On-Demand (DOD) inkjet devices offers a low cost, non-contact, low temperature, flexible, and data driven patterning approach. Existing inkjet printheads have a limited number of inkjet devices, which generate droplets on the scale of tens of microns. In our research, we have developed a monolithic inkjet printhead for maskless lithography based on silicon micro-machining technology. This printhead is composed of a large array of thermal bubble inkjet devices fabricated on a single silicon wafer. A high-resolution video imaging system has recorded stable generation of water droplets down to 3.5 μm. Au patterns as small as 8 μm have been formed on silicon substrates by printing with suspensions of Au nano-particles. Smaller droplet dimensions extending to the nano-scale is supported by theoretical analysis. This printhead technology can form the basis of a maskless lithography system with moderate throughput for building micro and nano-scale electronic circuits and MEMS devices.
机译:通过按需滴(DOD)喷墨设备产生的小液滴直接在基板上书写工艺图案,提供了一种低成本,非接触,低温,灵活和数据驱动的图案形成方法。现有的喷墨打印头具有数量有限的喷墨装置,其产生数十微米规模的液滴。在我们的研究中,我们已经开发了一种基于硅微加工技术的用于无掩模光刻的整体式喷墨打印头。该打印头由在单个硅晶片上制造的大量热气泡喷墨设备组成。高分辨率视频成像系统已记录了3.5微米以下水滴的稳定生成。通过用Au纳米粒子的悬浮液印刷在硅基板上形成了小至8μm的Au图案。理论分析支持较小的液滴尺寸扩展到纳米级。该打印头技术可以构成具有中等生产量的无掩模光刻系统的基础,用于构建微米和纳米级的电子电路和MEMS器件。

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