Laser plasma radiation sources based on a laser-irradiated gas puff target for x-ray and EUV lithography technologies

摘要

In this paper laser plasma radiation sources for x-ray and EUV lithography technologies are proposed. The sources are based on a recently developed double-stream gas puff target formed by pulsed injection of high-Z gas (argon or xenon) into a hollow stream of low-Z gas (helium or hydrogen) by using the double-nozzle setup. Strong x-ray and EUV production from the laser-irradiated double-stream gas puff target has been demonstrated. Characterization measurements of the source performed using a Nd:glass laser are presented and discussed.