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Luminescent Materials for EUV Detection Purposes

机译:用于EUV检测的发光材料

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In this paper we present the results of an elaborate study to investigate the properties of luminescent materials for EUV detection in EUV lithographic tools. The study presented here involves both bulk single crystalline samples and thin film samples. Bulk single crystalline samples with polished surfaces are industrially available, while thin film samples were home-made by performing physical vapor deposition of several luminescent materials on polished quartz substrates. Careful pre-selection of these phosphors was based on multiple strong criteria. The measured results presented here include time-resolved luminescence decay, luminescence spectra and luminescence linearity measurements under deep-UV (248 nm) and extreme-UV (13.5 nm) excitation. Our results indicate the possible use of two luminescent materials, being YAG:Ce (bulk) and CaS:Ce (thin film), for EUV detection in extreme-UV lithographic tools. Practical use of these luminescent materials, however, will require high extreme-UV powers in order to obtain a sufficient signal to noise ratio.
机译:在本文中,我们介绍了一项详尽的研究结果,以研究在EUV光刻工具中用于EUV检测的发光材料的特性。本文介绍的研究涉及块状单晶样品和薄膜样品。具有抛光表面的大块单晶样品可从工业上获得,而薄膜样品是通过在抛光的石英基板上进行几种发光材料的物理气相沉积而自制的。这些荧光粉的仔细预选基于多个严格的标准。此处介绍的测量结果包括深紫外(248 nm)和极端紫外(13.5 nm)激发下的时间分辨发光衰减,发光光谱和发光线性度测量。我们的结果表明,可以使用两种发光材料,YAG:Ce(散装)和CaS:Ce(薄膜),在极端UV光刻工具中进行EUV检测。然而,为了获得足够的信噪比,这些发光材料的实际使用将需要高的极端紫外线功率。

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