首页> 外文会议>Conference on Advanced Environmental Sensing Technology Ⅱ Oct 31-Nov 1, 2001, Newton, USA >Enhancement in ZnS:Mn triboluminescent film intensity using ZnO films as buffer layers
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Enhancement in ZnS:Mn triboluminescent film intensity using ZnO films as buffer layers

机译:使用ZnO薄膜作为缓冲层提高ZnS:Mn摩擦发光薄膜的强度

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摘要

We have investigated the effect of ZnO films used as buffer layers on the triboluminescence (TrL) intensity of ZnS:Mn thin films on quartz substrates using RF magnetron sputtering method and annealing technique. Highly oriented film of ZnO was firstly deposited on quartz glass substrate and then the ZnS:Mn film was successfully deposited on the ZnO film with orientation. By annealing at 5% H_2 in Ar ambient, the crystallinity of both ZnO and ZnS:Mn films was increased. It was found that the addition of the ZnO buffer layer greatly improve the TrL intensity of the ZnS:Mn films.
机译:我们利用射频磁控溅射法和退火技术研究了用作缓冲层的ZnO膜对ZnS:Mn薄膜的三荧光发光(TrL)强度的影响。首先在石英玻璃基板上沉积高取向的ZnO薄膜,然后成功地将ZnS:Mn薄膜定向沉积在ZnO薄膜上。通过在Ar气氛中在5%H_2下退火,ZnO和ZnS:Mn薄膜的结晶度都提高了。发现添加ZnO缓冲层极大地改善了ZnS:Mn膜的TrL强度。

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