Stabilizing the response of Pd/Ni alloy films to hydrogen iwth Ti adhesion layers

摘要

We have studied catalytic thin film resistors made from a Pd and Ni alloy, and propose a method for dramatically reducing the drift of the measured resistance. The resistnaces of Pd films increase monotonically when exposed to hydrogen, however a stable baseline is difficult to achieve and alpha to beta phase transitions result in hysteresis. It is known that at high hydrogen concentrations, the Pd film cracks and delaminates, however long-term exposures to low concentrations of hydrogen can also result in delaminations. Studies using Pd/Ni alloys show that the phase transition can be suppressed. High temperature anneals in 2