Software for analysis of the process of formation of the catalytic mask in the off-electrode plasma

摘要

We investigated one of the technologies of forming microrelief of diffractive optical elements. The technology is based on using catalytic mask in off-electrode plasma. We have developed a software that allows to evaluate some important parameters of this technological process. First, it is the evaluation of numerical values of concentration profiles 'vacancies' and semiconductor atoms in the melt. Second, it is the evaluation of time for irradiation the 'metal -semiconductor' structure to achieve the desired depth and the doping concentration of the semiconductor atoms in the melt layer. This enabled to determine the best modes for generating a predetermined height of diffractive microrelief.