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Impact of Surface Modification via Plasma Treatment on the Response of Strain Sensor Based on MWCNTs/epoxy Nanocomposite

机译:等离子体处理表面改性对基于MWCNTs /环氧树脂纳米复合材料的应变传感器响应的影响

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Strain sensor based on MWCNTs/epoxy nanocomposite are attracting the attention of many researchers not only because they have low cost, but also because of the high sensitivity comparing to the conventional strain sensor due to the piezoresistive behavior under load. In this study, the objective is to achieve higher sensing sensitivity by enhancing the stress transfer between thin film/Substrate. To this aim, polyimide substrate was exposed to oxygen plasma treatment in order to activate and enhance the surfaces prior deposition of the MWCNTs/epoxy nanocomposite thin film. In fact, exposure time was varied 2, 4, 5, 10 min in order to investigate the impact on the electro-mechanical response. For deeply investigation, Atomic Force Microscopy (AFM) was used to examine the topography of the modified surfaces of the kapton HN by measuring the root-mean-squared (RMS) roughness. The AFM results show that the root-mean-squared (RMS) roughness of pristine PI film was 2.5 nm, increasing to 15.5 nm after 4 minutes oxygen plasma treatment. Furthermore, Raman spectroscopy was used to follow the changes on the molecular structure of surface following treatment time. A higher sensitivity was achieved after 4 min plasma with a gauge factor around 13.6.
机译:基于MWCNTs /环氧树脂纳米复合材料的应变传感器不仅吸引了他们的低成本,而且由于与传统应变传感器相比具有较高的灵敏度(由于在负载下的压阻特性)而引起了众多研究者的关注。在这项研究中,目标是通过增强薄膜/基板之间的应力传递来实现更高的感测灵敏度。为了这个目的,在沉积MWCNT /环氧纳米复合薄膜之前,将聚酰亚胺衬底暴露于氧等离子体处理以活化和增强表面。实际上,为了研究对机电响应的影响,曝光时间会在2、4、5、10分钟内变化。为了进行深入研究,使用原子力显微镜(AFM)通过测量均方根(RMS)粗糙度来检查Kapton HN改性表面的形貌。 AFM结果表明,原始PI膜的均方根(RMS)粗糙度为2.5 nm,在氧等离子体处理4分钟后增加到15.5 nm。此外,拉曼光谱法被用来追踪处理时间后表面分子结构的变化。等离子4分钟后,以约13.6的规格系数获得了更高的灵敏度。

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