Contamination sources and means of mitigation: A focus on particulate contamination, airborne molecular contamination, and biological contamination

摘要

The integrity of the research and overall production yields within nanotechnology cleanrooms and semiconductor production spaces is partially dependent on the cleanliness of the air within the space, and the ability of building systems technology to remove contaminants from outside air. As semiconductor manufacturers seek higher and higher levels of cleanliness in manufacturing spaces, research environments are also expected to provide comparable levels of cleanliness. The literature shows that airborne contaminants are typically classified as viable and non-viable particles and as airborne molecular contamination (vapor phase). This paper reviews the characteristics of these contaminant classifications and their occurrence in outside air. This paper also examines the unique characteristic of airborne molecular contaminants to convert to ultra fine and fine particles (10 to 100 nanometer diameters). Modeled building systems performance is examined for each type of airborne contaminant and compared to current and projected cleanroom criteria and standards.