首页> 外文会议>Atomic layer deposition applications 9 >Characterization of Atomic Layer Deposited Films as Diffusion Barriers for Silver Art Objects
【24h】

Characterization of Atomic Layer Deposited Films as Diffusion Barriers for Silver Art Objects

机译:原子层沉积薄膜作为银艺术品的扩散壁垒的表征

获取原文
获取原文并翻译 | 示例

摘要

In this article we report on the characterization of atomic layer deposited (ALD) films on silver alloy objects, both with regard to film porosity, which potentially limits their effectiveness as tarnish barriers, and with regard to color change upon deposition, which affects their visual appearance. We find that the porosity of ALD alumina films decreases with thickness, and shows no clear dependence on surface preparation, nor on multiple ALD oxide layering. We also find that the optimized structures for minimizing color change are sensitive to the composition of the alloy, and must be tuned accordingly.
机译:在本文中,我们报告了银合金物体上原子层沉积(ALD)膜的表征,既涉及膜的孔隙度(可能会限制其作为锈蚀障碍的有效性),也涉及沉积时的颜色变化(影响其视觉效果)出现。我们发现ALD氧化铝膜的孔隙率随厚度的增加而降低,并且对表面制备和多层ALD氧化物层都没有明确的依赖性。我们还发现,用于最小化颜色变化的优化结构对合金的成分敏感,必须进行相应的调整。

著录项

  • 来源
  • 会议地点 San Francisco CA(US)
  • 作者单位

    Department of Materials Science and Engineering, University of Maryland, College Park, MD 20742, USA;

    Department of Materials Science and Engineering, University of Maryland, College Park, MD 20742, USA;

    The Walters Art Museum, 600 N. Charles Street, Baltimore, MD 21201, USA;

    The Walters Art Museum, 600 N. Charles Street, Baltimore, MD 21201, USA;

    Department of Materials Science and Engineering, University of Maryland, College Park, MD 20742, USA;

    Department of Materials Science and Engineering, University of Maryland, College Park, MD 20742, USA;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号