首页> 外文会议>Asian Pacific Conference on Fracture and Strength;APCFS; 20061122-25;20061122-25; Sanya(CN);Sanya(CN) >Influence of Deposition Bias Voltage on Fatigue Cracking Behavior of Chromium Nitride Film Deposited on Steel
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Influence of Deposition Bias Voltage on Fatigue Cracking Behavior of Chromium Nitride Film Deposited on Steel

机译:沉积偏压对钢上氮化铬膜疲劳开裂行为的影响

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Three point bending fatigue tests were carried out to investigate the influence of bias voltage on fatigue behavior of medium carbon steel with chromium nitride film. The substrate material of the specimens was JIS S45C medium carbon steel. The chromium nitride films were coated at two different bias voltages (V_b = -20V, -300V) for fatigue test by arc ion plating method. As a result, the fatigue limit was improved by coating at low bias voltage, while the fatigue limit of high bias voltage samples decreased by coating. In order to clarify the difference between high and low bias voltages, the tensile test was performed using the coated specimens. For this test, the chromium nitride films were deposited at four different bias voltages. It was found the cracking behavior clearly changed between -40V and -80V. For low bias voltage samples, short cracks were initiated in the films, while the long cracks were initiated at same strain for high bias voltage samples. These differences between low and high bias voltage sample may be due to the elastic modulus of the film and droplets distribution in the film.
机译:进行了三点弯曲疲劳试验,以研究偏置电压对带有氮化铬膜的中碳钢疲劳行为的影响。样品的基材是JIS S45C中碳钢。通过两种不同的偏压(V_b = -20V,-300V)涂覆氮化铬膜,以通过电弧离子镀方法进行疲劳测试。结果,通过在低偏置电压下进行涂覆可以改善疲劳极限,而通过涂覆可以降低高偏置电压样品的疲劳极限。为了弄清高和低偏置电压之间的差异,使用涂层样品进行了拉伸试验。对于该测试,在四个不同的偏置电压下沉积氮化铬膜。发现开裂行为在-40V至-80V之间明显变化。对于低偏置电压样品,薄膜中会出现短裂纹,而对于高偏置电压样品,长裂纹会在相同应变下产生。低偏压样品和高偏压样品之间的这些差异可能是由于薄膜的弹性模量和薄膜中的液滴分布所致。

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