CONTRIBUTIONS TO THE DETERMINATION IN-SITU OF LAYER THICKNESS AND GLOSSINESS OF GALVANIC DEPOSITS

机译：原位沉积电沉积层厚度和光泽度测定的贡献

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The papers presents the achievements of a collective research on promoting new methods and equipments to determine in situ, continuously and automatically the glossiness and thickness layer of galvanic deposits. The determined sizes are used in an advanced qualitative and quantitative characterization of the galvanic process.

机译：本文介绍了集体研究的成果，这些研究促进了新方法和新设备的现场，连续和自动确定电沉积的光泽度和厚度层。所确定的尺寸用于电流过程的高级定性和定量表征。

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《International DAAAM Symposium on Intelligent Manufacturing Automation : Focus on Interdisciplinary Solutions;European DAAAM International Young Researches and Scientists Conference》|2010年|p.1005-1006|共2页
会议地点 Zadar(HR);Zadar(HR)
作者
GUTT S; GUTT G; VASILACHE V; POROCH - SERITAN M;
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原文格式 PDF
正文语种 eng
中图分类机械制造工艺;
关键词
measurement; thickness; gloss; automatically;

机译：测量;厚度;光泽度自动地;

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3. Reflection ellipsometry for in-situ determination of complex permittivity and thickness of a single-layer material at several angles of incidence and frequencies [J] . F. Sagnard Microwave and optical technology letters . 2003,第4期

机译：反射椭圆仪用于在多个入射角和频率下原位确定单层材料的复介电常数和厚度
4. CONTRIBUTIONS TO THE DETERMINATION IN-SITU OF LAYER THICKNESS AND GLOSSINESS OF GALVANIC DEPOSITS [C] . GUTT S, GUTT G, VASILACHE V, International DAAAM Symposium on Intelligent Manufacturing Automation : Focus on Interdisciplinary Solutions . 2010

机译：对原位的贡献层厚度和电流沉积物的光泽度
5. In-Situ Far Ultraviolet Optical Characterization of Atomic Layer Deposited Oxides and Fluorides [D] . Huang, Zhiyu. 2021

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7. Atom Probe Tomography Characterization of Thin Copper Layers on Aluminum Deposited by Galvanic Displacement [O] . Zhang Yi, Ai Jiahe, Hillier Andrew C., 2012

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CONTRIBUTIONS TO THE DETERMINATION IN-SITU OF LAYER THICKNESS AND GLOSSINESS OF GALVANIC DEPOSITS

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