Study on Diazonaphthoquinone Positive Photoresist Composition for LCD

摘要

We report on a study of the diazonaphthoquinone (DNQ) positive photoresist composition for LCD . Photoresist is the important material used for the electrode of LCD.LCD photoresist consists of photoactive compounds 、 binder resin and organic solvent.We first study the esterification of 3,4,5-trihydroxybenzophenone 、 2,2,4,4 -tetrahydroxybenzophenone and l,2-DNQ-4-or-5 -sulfonylchloride , then the conventional photoactive compounds were synthesized . The properties of the conventional photoresist composition were also studied . Our work focuses on exploring new type of photoactive compounds . We prepared the new phenol compounds: 7,8-dihydroxy-4-methylcoumarin 、 6,7-dihydroxy-3,3-diphenyl-3H-benzenefuran-2- ketone , and then reacted with 1,2 —DNQ-4-or-5-sulfonyl chloride.The new photoactive compounds were used with PGMEA as organic solvent and the novolac resin as binder resin , then the photoresist composition was prepared. The photoresist composition was coated on the pretreated ITO films and ITO glasses. After the prebake、 exposure 、 developing 、hard bake, a desired pattern was produced . The properties of photoresist composition , for example: photosensitivity , resolution and developing performance were good, and the photosensitivity can reach to 40.5mJ.cm~(-2), the resolution can be 1μm.