School of Chemical Biomolecular Engineering, Georgia Institute of Technology Atlanta, GA 30332-0100;
School of Chemistry and Biochemistry, Georgia Institute of Technology Atlanta, GA 30332;
School of Chemistry and Biochemistry, Georgia Institute of Technology Atlanta, GA 30332;
SEMATECH, 257 Fuller Rd, Suite 2200, Albany, NY, USA 12203,SUNY Polytechnic Institute, 257 Fuller Rd, Albany, NY, USA 12203;
SEMATECH, 257 Fuller Rd, Suite 2200, Albany, NY, USA 12203;
School of Chemistry and Biochemistry, Georgia Institute of Technology Atlanta, GA 30332;
School of Chemical Biomolecular Engineering, Georgia Institute of Technology Atlanta, GA 30332-0100,School of Chemistry and Biochemistry, Georgia Institute of Technology Atlanta, GA 30332;
chemically amplified photoresist; negative tone; molecular resist; epoxide resist; cationic polymerization; solvent development; photodecomposable nucleophile; nucleophilic quencher; base developable; underlayer;
机译:基于多酚衍生物的新型负性分子抗蚀剂用于极端紫外光刻
机译:基于杯芳烃的EUV光刻新的负性分子抗蚀剂的开发
机译:用于EUV和EB光刻的负音分子抗蚀剂的表征
机译:优化交联负性分子抗蚀剂的性能
机译:分子动力学代理应用程序可优化极端条件下的仿真性能
机译:深入了解运动诱发炎症的分子病因:优化表现的机会
机译:用于EUV光刻的负色度化学放大分子抗蚀剂平台的11nm半间距分辨率