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Uncooled IRFPA technologies: state of the art and developments at LETI/LIR

机译:未冷却的IRFPA技术:LETI / LIR的最新技术和发展

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Abstract: Today, large numbers of uncooled IR detector developments are under progress due to the availability of silicon technology that enables realization of low cost 2D IR arrays. Development of such a structure involves a lot of trade-offs between the different parameters which characterize these detectors: (i) IR flux absorption, (ii) measurement of the temperature increase due to the incoming IR flux absorption, (iii) thermal insulation between detector and readout circuit, (iv) readout of thermometer temperature variation. These trade-offs explain the number of different approaches which are under worldwide development. We present a rapid survey of the state of the art through these developments. If the most advance developments are found in the US and Great Britain, it is important to analyze the work which is being done by Japanese companies like MITSUBISHI, NEC,...which are involved since a few years in that area. LETI/LIR has chosen resistive amorphous silicon as thermometer for this uncooled microbolometer development. After a first phase dedicated to the acquisition of the most important detector parameters in order to help the modeling and the technological development, an IRCMOS laboratory model was realized and characterized. It was shown that NETD of 80 mK at f/1, 25 Hz and 300 K background can be obtained with high thermal insulation. !11
机译:摘要:由于硅技术的可用性,实现了低成本的2D IR阵列,如今,大量非制冷IR检测器的开发正在进行中。这种结构的发展涉及表征这些检测器的不同参数之间的许多权衡:(i)红外通量吸收,(ii)由于入射红外通量吸收而引起的温度升高的测量,(iii)检测器和读出电路,(iv)读出温度计的温度变化。这些折衷解释了世界范围内正在发展的不同方法的数量。通过这些发展,我们对现有技术进行了快速调查。如果在美国和英国发现了最先进的发展,则重要的是分析由日本公司(例如MITSUBISHI,NEC等)从事的工作,这些公司已经在该领域工作了几年。 LETI / LIR为这种未冷却的微辐射热计的开发选择了非晶硅作为温度计。在第一阶段致力于获取最重要的检测器参数以帮助建模和技术开发之后,就实现了IRCMOS实验室模型并对其进行了表征。结果表明,在f / 1、25 Hz和300 K背景下,NETD可以达到80 mK,并且具有很高的隔热性。 !11

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