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Light confinement effect of non-spherical nanoscale solid immersion lenses

机译:非球形纳米级固体浸没透镜的光限制效应

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摘要

We report on the light confinement effect observed in non-ideally shaped (i.e., non-spherical) nanoscale solid immersion lenses (SILs). To investigate this effect, nanostructures of various shapes are fabricated by electron-beam lithography. When completely melted in reflow, these non-circular pillars become spherical, while incomplete melting results in non-spherically shaped SILs. Optical characterization shows that non-ideal SILs exhibit a spot size reduction comparable to that of spherical SILs. When the SIL size is wavelength scale or smaller, aberrations are negligible due to the short optical path length. This insensitivity to minor variations in shape implies a large tolerance in nano-SIL fabrication.
机译:我们报告了在非理想形状(即非球形)的纳米级固体浸没透镜(SIL)中观察到的光限制效应。为了研究这种效果,通过电子束光刻制造了各种形状的纳米结构。当在回流中完全熔化时,这些非圆形柱会变成球形,而不完全熔化会导致形成非球形的SIL。光学特征表明,非理想的SIL的光斑尺寸减小程度与球形SIL相当。当SIL尺寸为波长或更小时,由于光路长度短,所以像差可以忽略。对形状的微小变化不敏感,这意味着在纳米SIL制造中具有较大的公差。

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  • 来源
  • 会议地点 San Francisco CA(US)
  • 作者单位

    Optics Photonics Technology Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), Neuchatel, CH-2000, Switzerland,SUSS MicroOptics SA, Rouges-Terres 61, Hauterive, CH 2068, Switzerland;

    Optics Photonics Technology Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), Neuchatel, CH-2000, Switzerland;

    Optics Photonics Technology Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), Neuchatel, CH-2000, Switzerland;

    Department of Electrical and Computer Engineering, Montana State University, P.O. Box 173780, Bozeman, Montana 59717-3780, USA;

    Department of Electrical and Computer Engineering, Montana State University, P.O. Box 173780, Bozeman, Montana 59717-3780, USA;

    Department of Electrical and Computer Engineering, Montana State University, P.O. Box 173780, Bozeman, Montana 59717-3780, USA;

    Optics Photonics Technology Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), Neuchatel, CH-2000, Switzerland;

    Optics Photonics Technology Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), Neuchatel, CH-2000, Switzerland;

    SUSS MicroOptics SA, Rouges-Terres 61, Hauterive, CH 2068, Switzerland;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Solid immersion lens (SIL); nano-fabrication; electron beam lithography (EBL); thermal reflow; soft lithography; high-resolution interference microscope (HRIM);

    机译:固体浸没透镜(SIL);纳米加工电子束光刻(EBL);热回流软光刻高分辨率干涉显微镜(HRIM);

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